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Extreme ultraviolet lithography market is expected to have a market value of US$ 1,918.8 million in 2023 and US$ 17,353 million in 2033, with a compound annual growth rate (CAGR) of 24.6%. The increasing prevalence of smartphones worldwide is contributing to the growth of the extreme ultraviolet lithography industry.

Following its introduction, lithography technology was extensively used in microprocessors. The semiconductor industry’s constant progress and innovation has led to the creation of enhanced lithography methods including extreme UV lithography. During the projected era, it is expected that traditional optical lithography techniques now in use will gradually be replaced by extreme ultraviolet lithography technologies.

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Extreme ultraviolet lithography (EUVL) is a technology used in semiconductor manufacturing to produce smaller and more complex integrated circuits. EUVL uses light in the extreme ultraviolet (EUV) range, with wavelengths of 10-14 nanometers, to create patterns on a silicon wafer.

The EUVL market is driven by the increasing demand for higher-performance and lower-power semiconductors in various applications such as smartphones, data centers, and the Internet of Things (IoT). EUVL offers several advantages over traditional lithography techniques, including higher resolution, better contrast, and the ability to produce smaller features. These advantages enable manufacturers to produce more advanced and complex semiconductor chips, which are essential for the development of next-generation technologies.

The EUVL market is expected to grow significantly in the coming years, driven by factors such as increasing investment in semiconductor manufacturing, advancements in EUV light source technology, and the development of new and innovative applications for EUVL. Some of the key players in the EUVL market include ASML, Canon, Intel, Nikon, and Samsung, among others.

However, the market also faces some challenges, such as the high cost of EUVL equipment and the complexity of the manufacturing process. EUVL requires a highly specialized and controlled environment, which can be expensive to maintain. In addition, the development of EUVL technology requires significant investment in research and development, which can be a barrier to entry for smaller companies.

Despite these challenges, the EUVL market is expected to continue growing in the coming years, driven by the increasing demand for advanced semiconductors and the need for more advanced lithography technologies to support their development.

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Market Competition

• Intel Corporation,
• Nikon Corporation,
• Canon Inc.,
• IBM Corporation,
• ASML, and
• Samsung Corporation

are some of the main participants in the Extreme Ultraviolet Lithography industry.

Recent Market Developments in the Extreme Ultraviolet Lithography Market:

• In July 2022, Nikon announced collaboration with the environmental and water management organisation CIWEM and the free streaming platform WaterBear committed to the future of the world to identify the 2022 Environmental Photographer of the Year. The yearly competition, now in its 15th year, strives to highlight the most inspirational environmental photography from across the world and give an international platform to raise awareness of environmental concerns that threaten the planet.

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Key Segments Profiled in the Extreme Ultraviolet Lithography Industry Survey

Extreme Ultraviolet Lithography Market by Light Source Type:

• Laser Produced Plasmas
• Vacuum Sparks
• Gas Discharges

Extreme Ultraviolet Lithography Market by Application:

• Light Emitting Diodes (LEDs)
• Micro-Fluidics
• Micro-Needles
• Biotechnology

Extreme Ultraviolet Lithography Market by Region:

• North America
• Latin America
• Europe
• Asia Pacific
• Middle East & Africa